Study on optical and structural properties of TiO2/SnO2 thin film for optical devices
DOI:
https://doi.org/10.61343/jcm.v2i02.65Keywords:
Thin film, E-Beam, XRD, UV-Vis, AFMAbstract
The TiO₂/SnO₂ thin films have garnered considerable attention for their application in optical devices due to their superior transparency and stability. This study investigates the optical and structural properties of TiO₂/SnO₂ thin films prepared through electron beam (e-beam) evaporation. The films were annealed at 400°C for one hour in a muffle furnace to evaluate the influence of annealing on their properties. Characterization techniques, including X-ray diffraction (XRD), UV-Vis spectroscopy, and atomic force microscopy (AFM), were employed to analyze the films. XRD analysis confirmed the presence of a distinct anatase TiO₂ phase with SnO₂ inclusions. Post-annealing, an enhancement in the peak intensities of both phases was observed, signifying improved crystallinity and atomic ordering. UV-Vis spectroscopy revealed that the annealed films exhibited reduced optical absorbance compared to their pristine counterparts. Furthermore, the optical bandgap increased from 4.10 eV for the pristine films to 4.32 eV after annealing. In AFM analysis 2D and 3D surface topographical images demonstrated that the annealed films show a smoother surface with reduced roughness, attributed to the enhanced crystallinity, which mitigates structural defects and grain boundary irregularities. These findings highlight the exceptional optical and structural characteristics of TiO₂/SnO₂ thin films, suggesting their potential for use in antireflective coatings, photodetectors, and waveguide structures in optoelectronic devices.
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